LC/MS Solvents
Designed exclusively for LC/MS analysis and undergo specification testing to ensure suitability, stability and reproducibility including particle test. This minimizes damaging instruments such as pumps and injectors.
By reviewing the manufacturing method, FUJIFILM Wako has achieved a reduction of background noise.
Features
- Low background noise
- Uses a special glass bottle that suppresses the elution of sodium, etc. (Japanese Patent No. 4586729)
- Guarantee particles
- Conducted "Suitability for LC/MS analysis"
Reduced background noise by reviewing the manufacturing method (ex. Acetonitrile)
Specifications
| Acetonitrile | Methanol | 2-Propanol | Pure water | ||
| QC items | specifications | ||||
| Appearance | colorless, clear liquid | colorless, clear liquid | colorless, clear liquid | colorless, clear liquid | |
| Specific Gravity (20°C) | 0.780～0.783g/mL | 0.789～0.792g/mL | 0.784～0.787g/mL | 0.997～0.999g/mL | |
| Reflective index (20°C) | 1.343～1.346 | 1.327～1.330 | 1.376～1.378 | 1.332～1.334 | |
| Absorbance | 200nm | 0.05 max. | - | - | - |
| 210nm | 0.03 max. | 0.60 max. | 0.05 max. | 0.01 max. | |
| 220nm | 0.02 max. | 0.03 max. | - | ||
| 230nm | 0.01 max. | 0.15 max. | 0.10 max. | ||
| 240nm | 0.005 max. | 0.06 max. | - | ||
| 254nm | - | 0.015 max. | 0.01 max. | ||
| 260～400nm | - | 0.01 max. | |||
| Moisture | 0.05% max. | 0.05% max. | 0.05% max. | - | |
| Residue after evaporation | 0.001% max. | 5ppm max. | 0.001% max. | 5ppm max. | |
| Acidity (as acetic acid) | 0.001% max. | 0.001% max. | 0.001% max. | - | |
| Ammonium (as NH4) | 0.3ppm max. | - | - | - | |
| peroxide (as H2O2) | 5ppm max. | 5ppm max. | 5ppm max | 0.5ppm max | |
| Fluorescence test | to pass test | to pass test | to pass test | to pass test | |
| Substances reducing permanganate |
to pass test | - | - | to pass test | |
| Gradient test | to pass test | - | - | to pass test | |
| Assay (capillary GC) | 99.8% min. | 99.7% min. | 99.7% min. | - | |
| pH (25°C) | - | - | - | 5.0～7.5 | |
| Total organic carbon (TOC) | - | - | - | 4ppb max. | |
| Particles (0.5 μm and more) | 100/ml max. | 100/ml max. | 100/ml max. | 100/ml max. | |
| Suitability for LC/MS analysis | to pass test | to pass test | to pass test | - | |
Data
Comparison with Competitors
We compared the background data in the QTofMS measurement of our acetonitrile (for LC/MS, Code No. 012-19851, 018-19853) and competitor's equivalent products. While FUJIFILM Wako's product showed a low background, competitor's equivalent products showed a high background after a retention time of 4 min., and impurity peaks were confirmed.
Stable measurement results can be obtained by using FUJIFILM Wako’s LC/MS solvent series.
Positive mode
Negative mode
Product List
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For research use or further manufacturing use only. Not for use in diagnostic procedures.
Product content may differ from the actual image due to minor specification changes etc.
If the revision of product standards and packaging standards has been made, there is a case where the actual product specifications and images are different.